[2PS-266]
Nitroxide-Mediated Polymerization and Deprotection for the Synthesis of Poly(4-vinylphenol)
발표자이진석 (한국화학연구원)
연구책임자김태형 (한국화학연구원), 채창근 (한국화학연구원)
Abstract
Poly(4-vinylphenol) (P4VPh) is a key precursor for KrF photoresist resins, where minimizing line edge roughness in photolithography depends on achieving narrow molecular weight distributions. To achieve this, we synthesized well-defined P4VPh via nitroxide-mediated polymerization followed by acid-catalyzed deprotection. First, homopolymerizations of 4-acetoxystyrene and 4-tert-butoxystyrene were carried out. GPC confirmed predictable molecular weights based on monomer-to-initiator feed ratios, and low Ð (<1.20) was obtained across various ratios. Through the optimization of reaction parameters, we established polymerization conditions that promoted controlled radical propagation and minimized undesired pathways. Subsequent hydrolysis under optimized conditions was monitored by NMR, confirming deprotection to yield P4VPh. Moreover, undesired side reactions during deprotection were minimized, preserving both the molecular weight and Ð of the pristine polymer