[2PS-027]
Formation and Suppression of Photoresist-Derived Polymer Sludge in Packaging Process
발표자박규식 (인하대학교)
연구책임자윤창민 (인하대학교)
Abstract
In this study, we investigated the formation mechanism of polymer-based sludge arising from photoresist (PR) reactions in packaging processes and proposed a surfactant-based suppression strategy. Reproducible experiments using semiconductor-relevant chemicals confirmed that the sludge originates from hydrolysis and condensation of hexamethyldisilazane and DI water, which subsequently interacts with PR and developer to generate polymeric aggregates. These aggregates are stabilized through hydrophobic interactions and inter-polymer entanglement. Various ionic and nonionic surfactants were evaluated to suppress this formation. Our experimental results show that surfactants with long hydrocarbon chains effectively prevented aggregation between sludge seeds and polymeric residues. This work highlights a polymer science-based strategy to control undesired sludge formation in semiconductor packaging industry.
- 본 연구는 2025년도 정부(교육부)의 재원으로 한국연구재단의 지원을 받아 수행된 기초연구사업임(RS-2022-NR070869).