In celebration of the 50th anniversary of the Polymer Society of Korea (PSK), this special session highlights the historical evolution of photoresists over the past half-century and explores the future trajectory of advanced lithography materials. As we look forward to the next 50 years, the session will focus deeply on next-generation patterning technologies, particularly Chemically Amplified Resists (CAR) and Metal-Oxide Resists (MOR). Leading industry experts and academic researchers will present recent achievements and explore the fundamental mechanisms behind advanced EUV photoresists, process simulations, and innovative structural designs. By bringing together pioneers in the semiconductor materials industry, this session aims to foster interdisciplinary collaboration and stimulate discussion on the future challenges and opportunities in extreme ultraviolet (EUV) lithography.