POS1-1294
Molecularly Tunable PHSt-Based Polymers through Controlled Protection and Functionalization for Photoresist Applications
When and Where
Nov 30, -0001
12:00am - 12:00am
Presenter(s)
DONGJIN SHIN (Chungbuk National University)
Co-Author(s)
Abstract
In this study, the phenolic hydroxyl groups of poly(4-hydroxystyrene) (PHSt), which is widely used as a polymer for photoresist applications, were functionalized with various protecting groups. A method for controlling the degree of protection and functional group composition was investigated.
First, anionic polymerization of 4-tert-butoxystyrene (BSt) was carried out using sec-butyllithium (s-BuLi) and di-n-butylmagnesium (n-Bu₂Mg). Poly(4-tert-butoxystyrene) (PBSt) with a number-average molecular weight (Mₙ) of 11,300 g mol⁻¹ and a narrow dispersity (Đ) of 1.06 was obtained. The tert-butoxy protecting groups of PBSt were subsequently removed under acidic conditions to obtain PHSt.
The phenolic hydroxyl groups of PHSt were then subjected to sequential acetylation and acetalation. The degree of protection and functional group composition of the resulting polymers were controlled through selective deprotection under acidic or basic conditions.
Separately, a PHSt-based terpolymer containing O-trimethylstannyl, tert-butoxycarbonyl (t-Boc), and hydroxyl groups was synthesized. The Sn-containing PHSt-based polymer was mixed with a photoacid generator, and a preliminary dissolution contrast test was conducted.
First, anionic polymerization of 4-tert-butoxystyrene (BSt) was carried out using sec-butyllithium (s-BuLi) and di-n-butylmagnesium (n-Bu₂Mg). Poly(4-tert-butoxystyrene) (PBSt) with a number-average molecular weight (Mₙ) of 11,300 g mol⁻¹ and a narrow dispersity (Đ) of 1.06 was obtained. The tert-butoxy protecting groups of PBSt were subsequently removed under acidic conditions to obtain PHSt.
The phenolic hydroxyl groups of PHSt were then subjected to sequential acetylation and acetalation. The degree of protection and functional group composition of the resulting polymers were controlled through selective deprotection under acidic or basic conditions.
Separately, a PHSt-based terpolymer containing O-trimethylstannyl, tert-butoxycarbonyl (t-Boc), and hydroxyl groups was synthesized. The Sn-containing PHSt-based polymer was mixed with a photoacid generator, and a preliminary dissolution contrast test was conducted.
