POS5-0761
Synthesis and Properties of Low-Dielectric, Low-Loss Hydrocarbon Network
Topic
S5. Polymers for Electronics and Photonics
When and Where
Sep 29, 2026
08:30 - 09:30
Room 301 (Grand Ballroom)
Session Chairs
Hae Jung SON
Boseok KANG
Presenter(s)
Kim Jae Hyun (Kyung Hee University)
Co-Author(s)
Abstract
Insulating materials for high-frequency and high-speed electronic devices require not only low dielectric constant and low dielectric loss, but also excellent thermal stability and processability. However, conventional low-k network polymers often rely on multicomponent formulations or demanding curing processes, which can increase processing complexity and adversely affect dielectric performance.
Herein, we investigate a hydrocarbon-rich polymer network platform designed to balance dielectric performance with practical film fabrication. The material design enables network formation under mild processing conditions while maintaining a low-polarity molecular framework. Thin films prepared from this platform were evaluated in terms of processing behavior, thermal characteristics, and high-frequency dielectric response. The results suggest that controlling polymer architecture and network formation provides an effective route toward low-dielectric, low-loss polymer films for advanced electronic applications.
This work highlights the potential of architecture-guided polymer network design as a useful strategy for developing next-generation insulating materials with simplified processing and favorable dielectric properties.
Herein, we investigate a hydrocarbon-rich polymer network platform designed to balance dielectric performance with practical film fabrication. The material design enables network formation under mild processing conditions while maintaining a low-polarity molecular framework. Thin films prepared from this platform were evaluated in terms of processing behavior, thermal characteristics, and high-frequency dielectric response. The results suggest that controlling polymer architecture and network formation provides an effective route toward low-dielectric, low-loss polymer films for advanced electronic applications.
This work highlights the potential of architecture-guided polymer network design as a useful strategy for developing next-generation insulating materials with simplified processing and favorable dielectric properties.
